Photochemical dissociation of organic silicon source using Xe2 excimer lamp in gas phase

Shinku/Journal of the Vacuum Society of Japan

Volumn 43, Issue 3, 2000, Pages 288-291

  Horii, Naohiro ^a   Okimura, Kunio ^b   Inouye, Akihiro ^a  

^a FUKUI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b TOKAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; IRRADIATION; LIGHT ABSORPTION; MASS SPECTROMETRY; MERCURY (METAL); PHOTOCHEMICAL REACTIONS; PHOTODISSOCIATION; ULTRAVIOLET LAMPS; ULTRAVIOLET RADIATION; XENON;

EXCIMER LAMP; GAS PHASE; TETRAETHOXYSILANE; VACUUM ULTRAVIOLET SOURCES;

SILICON COMPOUNDS;

EID: 0033728762     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.43.288     Document Type: Article

References (5)

1. K. Awazu and H. Onuki: Appl. Phys. Lett., 69(4)22, (1996) 482.
2. Kunio Okimura and Naohiro Maeda: J. Vac. Sci. Technol., A16(6), (1998) 3157.
3. Tetsuya Satake, Tetsuji Sorita, Hirofumi Fujioka, Hiroshi Adachi and Hiroyuki Nakajima: Jpn. J. Appl. Phys. Vol. 33 (1994) 3339.