Dependence of film thickness on nitrogen ion energy and substrate temperature for titanium nitride films on stainless steel using an ion beam assisted deposition technique

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 82-86

  Yokota, Katsuhiro ^a   Tamura, Susumu ^a   Nakamura, Kazuhiro ^a   Horiguchi, Motohiro ^a   Nakaiwa, Hiroki ^a   Sugimoto, Takashi ^a   Akamatsu, Katsuya ^a   Nakao, Kazuyoshi ^a  

^a KANSAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; ION BEAMS; ION BOMBARDMENT; MIXING; POLYCRYSTALLINE MATERIALS; PROTECTIVE COATINGS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STAINLESS STEEL; THIN FILMS;

DYNAMIC MIXING; ION BEAM ASSISTED DEPOSITION (IBAD); STAINLESS STEEL SUS-304;

TITANIUM NITRIDE;

EID: 0033728729     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01058-7     Document Type: Article

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