SCOPUS 정보 검색 플랫폼

Volumn 145, Issue 2, 1998, Pages 676-683

The effects of processing parameters in the low-temperature chemical vapor deposition of titanium nitride from tetraiodotitanium

(9) Faltermeier, Cheryl G a Goldberg, Cindy a Jones, Michael a Upham, Allan a Knorr, Andreas a Ivanova, Ana a Peterson, Gregory a Kaloyeros, Alain E a Arkles, Barry b

a STATE UNIVERSITY OF NEW YORK (United States)

b Gelest Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; IODINE COMPOUNDS; LOW TEMPERATURE OPERATIONS; MOLECULAR STRUCTURE; MORPHOLOGY; NUCLEATION; PRESSURE EFFECTS; TEXTURES; THERMAL EFFECTS;

TETRAIODOTITANIUM;

TITANIUM NITRIDE;

EID: 0032001798 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1838322 Document Type: Article

Times cited : (12)

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