Microscopic fundamentals of electromagnetic functional metal/dielectric nanocomposite multilayer films

Surface and Coatings Technology

Volumn 130, Issue 1, 2000, Pages 100-109

  Wen, L S ^a   Huang, R F ^b   Liu, D C ^c   Hu, X T ^c   Bai, X D ^a   Sun, C ^a   Gong, J ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c Beijing Institute of Special Machinery   (China)

Author keywords

Electromagnetic response; Metal dielectric multilayer; Nanostructure

Indexed keywords

ALUMINUM; CARRIER CONCENTRATION; DIELECTRIC FILMS; ELECTRIC CONDUCTIVITY OF SOLIDS; FLUORINE; MECHANICAL PERMEABILITY; METALLIC FILMS; NANOSTRUCTURED MATERIALS; PERMITTIVITY; PLASMAS; TITANIUM;

ELECTROMAGNETIC RESPONSE;

MULTILAYERS;

EID: 0033727101     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00689-7     Document Type: Article

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