Low-temperature processing using triple alkoxide precursors for layer-structured perovskite thin films: Preparation and characterization of MBi2Ta2O9 (M: Ca or Ba) thin films

Materials Research Society Symposium - Proceedings

Volumn 596, Issue , 2000, Pages 167-172

  Kato, K ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BARIUM COMPOUNDS; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; FILM PREPARATION; LOW TEMPERATURE EFFECTS; OXYGEN; PEROVSKITE; RAPID THERMAL ANNEALING; SURFACE TOPOGRAPHY; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURE; LOW TEMPERATURE PROCESSING; TRIPLE ALKOXIDE PRECURSORS;

THIN FILMS;

EID: 0033725057     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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