Impact of nitrogen profile in gate oxynitride on complementary metal oxide semiconductor characteristics

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 4 B, 2000, Pages 2158-2161

  Tamura, Yasuyuki ^a   Shigeno, Mayumi ^a   Ohkubo, Satoshi ^a   Irino, Kiyoshi ^a   Nakanishi, Toshiro ^a   Takasaki, Kanetake ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

CMOS; N2O; Nitrogen profile; No; Oxynitride; X ray photoelectron spectroscopy

Indexed keywords

ELECTRIC PROPERTIES; ELECTRONIC DENSITY OF STATES; FIELD EFFECT TRANSISTORS; HIGH TEMPERATURE OPERATIONS; HOT CARRIERS; INTERFACES (MATERIALS); MASS SPECTROMETRY; MOLECULAR STRUCTURE; NITROGEN; NITROGEN COMPOUNDS; RELIABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC CONFIGURATION; INTERFACE STATE DENSITY; NITROGEN PROFILE; OXYNITRIDE; SECONDARY ION MASS SPECTROSCOPY;

CMOS INTEGRATED CIRCUITS;

EID: 0033723723     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.2158     Document Type: Article

References (11)

1. G. J. Hu and R. H. Bruce: IEEE Trans. Electron Devices ED-32 (1985) 584.
2. J. R. Pfiester, F. K. Baker, T. C. Mele, H.-H, Tseng, P. J. Tobin, J. D. Hayden, J. W. Miller, C. D. Gunderson and L. C. Parillo: IEEE Trans.Electron Devices ED-37 (1990) 1842.
3. J. Y.-C. Sun, C. Wong, Y. Taur and C.-H. Hsu: 1989 Symp. VLSI Tech. Dig. Tech. Pap. (1989) p. 17.
4. H. Hayashida, Y. Toyoshima, Y. Suizu, K. Milsuhashi, H. Iwai and K. Maeguchi: 1989 Symp. VLSI Tech. Dig. Tech. Pap. (1989) p. 29.
5. H. S. Momose, T. Morimoto, Y. Ozawa, K. Yamabe and H. Iwai: Int. Electron Devices Meet. Tech. Dig. (1991) p. 359.
6. S. V. Hattangady, R. Kraft, D. T. Grider, M. A. Douglas, G. A. Brown, P. A. Tiner, J. W. Kuehne, P. E. Nicollian and M. F. Pas: Int. Electron Devices Meet. Tech. Dig. (1996) p. 495.
7. B. Maiti, P. J. Tobin, V. Misra, R. I. Hegde, K. G. Reid and C. Gelatos: Int. Electron Devices Meet. Tech. Dig. (1997) p. 651.
8. G. Grosenken, H. E. Macs, N. Beltran and R. F. De Keersmaecker: IEEE Trans. Electron Devices ED-31 (1984) 42.
9. Handbook of X-Ray Photoelectron Spectroscopy, ed. J. Chastain (Perkin-Elmer Corporation, USA, 1992) p. 227.
10. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, eds. D. Briggs and M. P. Seah (John Wiley & Sons Ltd., New York, 1983) p. 133.
11. A. Ishizaka, S. Iwata and Y. Kamigaki: Surf. Sci. 84 (1979) 355.