Bulk micromachining of polycrystalline SiC using Si molds fabricated by Deep Reactive Ion Etching

Materials Science Forum

Volumn 338, Issue , 2000, Pages

  Rajan, N ^a   Zorman, C A ^a   Mehregany, M ^a  

^a Case Western Reserve University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTROMECHANICAL DEVICES; MICROMACHINING; POLYCRYSTALLINE MATERIALS; REACTIVE ION ETCHING; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

DEEP REACTIVE ION ETCHING (DRIE);

SILICON CARBIDE;

EID: 0033721918     PISSN: 02555476     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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