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Volumn 66, Issue 1, 2000, Pages 181-183

Hysteresis and drift effect of hydrogenated amorphous silicon for ISFET

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; HYSTERESIS; ION SENSITIVE FIELD EFFECT TRANSISTORS; PH; SILICON SENSORS;

EID: 0033718096     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(00)00341-5     Document Type: Article
Times cited : (24)

References (6)
  • 5
    • 0000181018 scopus 로고
    • Drift characteristics of pH-ISFET output
    • Yule Z., Shouan Z., Tao L. Drift characteristics of pH-ISFET output. Chin. J. Semicond. 15(12):1994;838-843.
    • (1994) Chin. J. Semicond. , vol.15 , Issue.12 , pp. 838-843
    • Yule, Z.1    Shouan, Z.2    Tao, L.3
  • 6
    • 0021483678 scopus 로고
    • The role of buried OH sites in the response mechanism of inorganic-gate pH-sensitive ISFETs
    • Bosse L., Bergveld P. The role of buried OH sites in the response mechanism of inorganic-gate pH-sensitive ISFETs. Sens. Actuators. 6:1984;65-78.
    • (1984) Sens. Actuators , vol.6 , pp. 65-78
    • Bosse, L.1    Bergveld, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.