Resolution of the multiple aperture pixel by pixel enhancement of resolution electron lithography concept

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 117-121

  Kampherbeek, B J ^a   Wieland, M J ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; ELECTRIC FIELD EFFECTS; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRON SOURCES; INTEGRATED CIRCUIT MANUFACTURE; MAGNETIC FIELD EFFECTS; NANOTECHNOLOGY;

MULTIPLE APERTURE PIXEL BY PIXEL ENHANCEMENT OF RESOLUTION (MAPPER);

ELECTRON BEAM LITHOGRAPHY;

EID: 0033712833     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591161     Document Type: Article

References (4)

1. P. Kruit, J. Vac. Sci. Technol. B 16, 3177 (1998).
2. R. Ward, A. R. Franklin, L. H. Lewin, P. A. Gould, and M. J. Plummer, J. Vac. Sci. Technol. B 4, 89 (1985).
3. J. D. Jackson, Classical Electrodynamics (Wiley, New York, 1975).
4. J. P. Scott, J. Vac. Sci. Technol. 15, 1016 (1978).