Comparative study of Ni nanowires patterned by electron-beam lithography and fabricated by lift-off and dry etching techniques

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 16-20

  Park, Y D ^a   Jung, K B ^a   Overberg, M ^a   Temple, D ^a,b   Pearton, S J ^a   Holloway, P H ^a  

^a UNIVERSITY OF FLORIDA   (United States)

^b MCNC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; EVAPORATION; MAGNETIC THIN FILMS; MAGNETIZATION; MAGNETORESISTANCE; MAGNETRON SPUTTERING; MASKS; MORPHOLOGY; NICKEL; SPUTTER DEPOSITION;

MAGNETIC REVERSAL; NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 0033698954     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591143     Document Type: Article

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