Structural studies and influence of the structure on the electrical and optical properties of microcrystalline silicon thin films produced by RF sputtering

Thin Solid Films

Volumn 370, Issue 1, 2000, Pages 128-136

  Cerqueira, M F ^a   Ferreira, J A ^a   Adriaenssens, G J ^b  

^a UNIVERSITY OF MINHO   (Portugal)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELECTRIC PROPERTIES; GLASS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON; SIZE DETERMINATION; STRAIN; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINITY; MICROCRYSTALLINE SILICON THIN FILMS; PSEUDO VOIGT FUNCTION; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0033690663     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00950-0     Document Type: Article

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