Monte Carlo simulation of generations of continuous and characteristic X-rays by electron impact

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 5 A, 2000, Pages 2863-2864

  Fujii, Kentaro ^a   Nagatomi, Takaharu ^a   Kimura, Yoshihide ^a   Takai, Yoshizo ^a   Shimizu, Ryuichi ^a   Obori, Ken Ichi ^b   Yurugi, Toshikazu ^b  

^a OSAKA UNIVERSITY   (Japan)

^b HORIBA LTD   (Japan)

Author keywords

High brightness X ray source; Monte Carlo simulation; W film on the Cu substrate

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; COPPER; MATHEMATICAL MODELS; METALLIC FILMS; MONTE CARLO METHODS; SUBSTRATES; TUNGSTEN; X RAY SPECTROSCOPY;

KIRKPATRICK-WIEDMANN-STATHAM EQUATION; X RAY SOURCES;

X RAY PRODUCTION;

EID: 0033688944     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.2863     Document Type: Article

References (10)

1. D. C. Joy: Monte Carlo Modeling for Electron Microscopy and Microanalysis (Oxford Univ. Press, Oxford, 1995).
2. K. F. J. Heinrich, D. E. Newbury and H. Yakowitz: Use of Monte Carlo Calculation in Electron Probe Microanalysis and Scanning Electron Microscopy (National Bureau of Standards, Washington, D.C., 1976) NBS Special Publication Vol. 460.
3. Z.-J. Ding, R. Shimizu and K. Obori: J. Appl. Phys. 76 (1994) 7180.
4. K. Obori, T. Yurugi, Z.-J. Ding, T. Nagatomi, K. Fujii, Y. Kimura and R. Shimizu: Jpn. J. Appl. Phys. 39 (2000) 1418.
5. M. Inokuchi: Rev. Mod. Phys. 43 (1971) 297.
6. E. Casnati, A. Tartan and C. Baraldi: J. Phys. B 15 (1982) 155.
7. M. Gryzinski: Phys. Rev. 138 (1965) 336.
8. P. Kirkpatrick and L. Wiedmann: Phys. Rev. 67 (1945) 321.
9. P. J. Statham: X-ray Spectrom. 5 (1976) 154.
10. B. L. Henke, E. M. Gullikson and J. C. Davis: At. Data & Nucl. Tables 54 (1993).