Composition and structure of NiTiCu shape memory thin films

Journal of Micromechanics and Microengineering

Volumn 10, Issue 2, 2000, Pages 147-151

  Frantz Rodriguez, Nadège ^a   Bosseboeuf, Alain ^a   Dufour Gergam, Elisabeth ^a   Stambouli Séné, Valérie ^a   Nouet, Gérard ^b   Seiler, Wilfrid ^b,c   Lebrun, Jean Lou ^b,c  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b LERMAT Laboratoire d'Etude et de Recherche sur les Materiaux   (France)

^c ARTS ET MÉTIERS PARISTECH   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; CRYSTALLIZATION; NICKEL ALLOYS; PRESSURE; SEMICONDUCTING SILICON; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); TEMPERATURE;

GAS PRESSURE; THIN FILM DEPOSITION;

THIN FILMS;

EID: 0033682797     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/2/308     Document Type: Article

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