Preparation and Properties of Boron Thin Films

Journal of Solid State Chemistry

Volumn 133, Issue 1, 1997, Pages 100-103

  Kamimura, Kiichi ^a   Ohkubo, Miyako ^a   Shinomiya, Toshio ^a   Nakao, Masato ^a   Onuma, Yoshiharu ^a  

^a SHINSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002030874     PISSN: 00224596     EISSN: None     Source Type: Journal    
DOI: 10.1006/jssc.1997.7323     Document Type: Article

References (8)

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2. Prudenziati M. Characterization of boron films. Thin Solid Films. 36:1976;97.
3. Petrov A. V., Germaidze M. S., Golikova O. A., Yu Kiskachi A., Mativeev V. N. The relationship between the thermal conductivity and crystal structure ofβ Sov. Phys. Solid State. 11:1969;741.
4. Matuda N., Baba S., Kinbara A. Mechanical properties of boron films. Thin Solid Films. 89:1982;139.
5. Shirai K., Gonda S. Characterization of hydrogenated amorphous boron films prepared by electron cyclotron resonance plasma chemical vapor deposition method. Appl. Phys. 67:1990;6286.
6. Cirri G. F., Fidanzati G., Forlani F. Boron thermistors. Thin Solid Films. 36:1976;487.
7. Nakamura K. Preparation and properties of amorphous boron films deposited by pyrolysis of decaborane in the molecular flow region. J. Electrochem. Soc. 131:1984;2691.
8. Spitzer W. G., Kaiser W. Optical properties of crystalline boron. Phys. Rev. Lett. 1:1958;230.