Single-step selective metallization of Mg/NH3 pretreated Teflon by copper chemical vapor deposition

Microelectronic Engineering

Volumn 50, Issue 1-4, 2000, Pages 383-390

  Doppelt, P ^a   Combellas, C ^a   Kanoufi, F ^a   Chen, T Y ^a   Richardson, S ^a   Thiebault A ^a  

^a PSL RESEARCH UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; COPPER; MAGNESIUM; METALLIC FILMS; METALLIZING; OXIDATION; X RAY PHOTOELECTRON SPECTROSCOPY;

SINGLE-STEP SELECTIVE METALLIZATION;

POLYTETRAFLUOROETHYLENES;

EID: 0033640038     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00306-8     Document Type: Article

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