Characterization of Si1-cursive greek chiGecursive greek chi thin films prepared by sputtering

Journal of the Korean Physical Society

Volumn 36, Issue 1, 2000, Pages

  Noguchi, Takashi ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033633557     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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