Mechanistic studies of photochemical silylene extrusion from 2,2- diphenylhexamethyltrisilane

Journal of the American Chemical Society

Volumn 121, Issue 15, 1999, Pages 3651-3656

  Miyazawa, Takashi ^b,c   Koshihara, Shin Ya ^b,c   Liu, Chengyou ^b   Sakurai, Hideki ^a,d   Kira, Mitsuo ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^d TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

2,2 DIPHENYLHEXAMEHTYLTRISILANE; ARYLOLIGOSILANE; SILANE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; KINETICS; MATHEMATICAL ANALYSIS; PHOTOCHEMISTRY; PHOTOREACTIVITY; REACTION ANALYSIS;

EID: 0033594464     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja983370k     Document Type: Article

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