-
1
-
-
0000596895
-
-
1 C. Rompf, D. Ammermann and W. Kowalsky, J. Mater. Sci., 1995, 11, 845.
-
(1995)
J. Mater. Sci.
, vol.11
, pp. 845
-
-
Rompf, C.1
Ammermann, D.2
Kowalsky, W.3
-
2
-
-
0021386710
-
-
2 S. R. Forrest, M. L. Kaplan and P. H. Schmidt, J. Appl. Phys., 1984, 55, 1492.
-
(1984)
J. Appl. Phys.
, vol.55
, pp. 1492
-
-
Forrest, S.R.1
Kaplan, M.L.2
Schmidt, P.H.3
-
3
-
-
0343650358
-
-
3 M. Stolka, J. F. Yanus and D. M. Pai, J. Phys. Chem., 1984, 88, 4707.
-
(1984)
J. Phys. Chem.
, vol.88
, pp. 4707
-
-
Stolka, M.1
Yanus, J.F.2
Pai, D.M.3
-
4
-
-
0028491651
-
-
4 Y. Shirota, Y. Kuwabara, H. Inada, T. Wakimoto, H. Nakada, Y. Yonemoto, S. Kawami and K. Imai, Appl. Phys. Lett., 1994, 56, 807.
-
(1994)
Appl. Phys. Lett.
, vol.56
, pp. 807
-
-
Shirota, Y.1
Kuwabara, Y.2
Inada, H.3
Wakimoto, T.4
Nakada, H.5
Yonemoto, Y.6
Kawami, S.7
Imai, K.8
-
5
-
-
0013572967
-
-
Osaka, Japan
-
5 P. Urbach, C. Rompf. D. Ammermann and W. Kowalsky, SSDM '95, Osaka, Japan, 1995, 401.
-
(1995)
SSDM '95
, pp. 401
-
-
Urbach, P.1
Rompf, C.2
Ammermann, D.3
Kowalsky, W.4
-
6
-
-
0013573881
-
-
Yokohama, Japan
-
6 P. Urbach, D. Ammermann and W. Kowalsky, SSDM '96, Yokohama, Japan, 1996, 586.
-
(1996)
SSDM '96
, pp. 586
-
-
Urbach, P.1
Ammermann, D.2
Kowalsky, W.3
-
8
-
-
24444456430
-
-
8 Y. Yang, E. Westerweele, C. Zhang, P. Smith, A. J. Heeger, J. Appl. Phys., 1995, 77, 694.
-
(1995)
J. Appl. Phys.
, vol.77
, pp. 694
-
-
Yang, Y.1
Westerweele, E.2
Zhang, C.3
Smith, P.4
Heeger, A.J.5
-
10
-
-
0029344840
-
-
10 Y. Hamada, T. Samo, K. Shibata, K. Kuroki, Jpn. J. Appl. Phys., 1995, 34, 824.
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
, pp. 824
-
-
Hamada, Y.1
Samo, T.2
Shibata, K.3
Kuroki, K.4
-
11
-
-
0347665516
-
-
Keystone, CO, USA
-
11 D. Ammermann, A Böhler, C. Rompf and W. Kowalsky, Proc. IEE/LEOS Summer Topical Meeting on Flat Panel Display Technology., Keystone, CO, USA, 1995, 31.
-
(1995)
Proc. IEE/LEOS Summer Topical Meeting on Flat Panel Display Technology
, pp. 31
-
-
Ammermann, D.1
Böhler, A.2
Rompf, C.3
Kowalsky, W.4
-
14
-
-
0029410024
-
-
14 A Schmidt, M. L. Anderson and N. R. Armstrong, J. Appl. Phys., 1995, 78, 5619.
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 5619
-
-
Schmidt, A.1
Anderson, M.L.2
Armstrong, N.R.3
-
15
-
-
0030079218
-
-
15 K. Seki, T. Tani and H. Ishii, Thin Solid Films, 1996, 273, 20.
-
(1996)
Thin Solid Films
, vol.273
, pp. 20
-
-
Seki, K.1
Tani, T.2
Ishii, H.3
-
16
-
-
0032023220
-
-
16 A. Rajagopal, C. I. Wu and A. Kahn, J. Appl. Phys., 1998, 83, 2649.
-
(1998)
J. Appl. Phys.
, vol.83
, pp. 2649
-
-
Rajagopal, A.1
Wu, C.I.2
Kahn, A.3
-
18
-
-
85069129529
-
-
18 T. Tsutui, N. Takada and S. Saito, Appl. Phys. Lett., 1994, 64, 1868.
-
(1994)
Appl. Phys. Lett.
, vol.64
, pp. 1868
-
-
Tsutui, T.1
Takada, N.2
Saito, S.3
-
19
-
-
0029291035
-
-
19 T. Sano, M. Fuyita, T. Fujii and Y. Hamada, Jpn. J. Appl. Phys., 1995, 34, 1883.
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
, pp. 1883
-
-
Sano, T.1
Fuyita, M.2
Fujii, T.3
Hamada, Y.4
-
20
-
-
21544468390
-
-
20 T. Tsutui, N. Takada and S. Saito, Appl. Phys. Lett., 1993, 63, 2032.
-
(1993)
Appl. Phys. Lett.
, vol.63
, pp. 2032
-
-
Tsutui, T.1
Takada, N.2
Saito, S.3
-
21
-
-
0028529526
-
-
21 A. Dodalapur, L. J. Rothberg and T. M. Miller, Appl. Phys. Lett., 1994, 65, 2308.
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 2308
-
-
Dodalapur, A.1
Rothberg, L.J.2
Miller, T.M.3
-
22
-
-
0039073660
-
-
22 T. Tsutsui, C. Adachi, S. Saito, M. Watanabe and M. Koishi, Chem. Phys. Lett., 1991,182, 143.
-
(1991)
Chem. Phys. Lett.
, vol.182
, pp. 143
-
-
Tsutsui, T.1
Adachi, C.2
Saito, S.3
Watanabe, M.4
Koishi, M.5
-
23
-
-
0001189074
-
-
23 T. Nakayama, Y. Itoh and A. Kakuta, Appl. Phys. Lett., 1993, 63, 594.
-
(1993)
Appl. Phys. Lett.
, vol.63
, pp. 594
-
-
Nakayama, T.1
Itoh, Y.2
Kakuta, A.3
-
24
-
-
21544468390
-
-
24 T. Takada, T. Tsutsui and S. Saito, Appl. Phys. Lett., 1993, 63, 2032.
-
(1993)
Appl. Phys. Lett.
, vol.63
, pp. 2032
-
-
Takada, T.1
Tsutsui, T.2
Saito, S.3
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