Low temperature epitaxial growth of ZnO layer by plasma-assisted epitaxy

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 12-17

  Yamauchi, S ^a   Handa, H ^a   Nagayama, A ^a   Hariu, T ^a  

^a IBARAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; ELECTRON EMISSION; EPITAXIAL GROWTH; LOW TEMPERATURE EFFECTS; MORPHOLOGY; OXYGEN; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; SURFACE TREATMENT; THICK FILMS;

BAND EDGE EMISSION; PHOTOLUMINESCENCE SPECTRA; PLASMA ASSISTED EPITAXY;

ZINC OXIDE;

EID: 0033531835     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00096-6     Document Type: Article

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