Highly textured hexagonal AlN films deposited at low temperature by reactive cathodic sputtering

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 59, Issue 1-3, 1999, Pages 88-93

  Brunet, F ^a   Randriamora, F ^a   Deneuville, A ^a   Germi, P ^a   Anterion, B ^a   Pernet, M ^a  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING SILICON; SILICA; SPUTTER DEPOSITION; TEXTURES;

ALUMINUM NITRIDE; REACTIVE CATHODIC SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0033528949     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(98)00345-6     Document Type: Article

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