A new UHV diffractometer for surface structure and real time molecular beam deposition studies with synchrotron radiations at ESRF

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 149, Issue 1-2, 1999, Pages 213-227

  Baudoing Savois, R ^a   De Santis, M ^a   Saint Lager, M C ^a   Dolle, P ^a   Geaymond, O ^a   Taunier, P ^a   Jeantet, P ^b   Roux, J P ^b   Renaud, G ^c   Barbier, A ^c   Robach, O ^c   Ulrich, O ^c   Mougin, A ^c   Berard G ^c  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^b CNRS   (France)

^c CEA GRENOBLE   (France)

Author keywords

07.85; 61.10; 68.55; Growth structure and epitaxy; Thin films; X ray instrumentation and techniques

Indexed keywords

ABSORPTION SPECTROSCOPY; DEPOSITION; FILM GROWTH; GONIOMETERS; MOLECULAR BEAM EPITAXY; SURFACE STRUCTURE; SYNCHROTRON RADIATION; THIN FILMS; VACUUM TECHNOLOGY; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING; X RAY SPECTROGRAPHS;

EXTENDED X RAY ABSORPTION FINE STRUCTURE (EXAFS) SPECTROSCOPY; MOLECULAR BEAM DEPOSITION;

DIFFRACTOMETERS;

EID: 0033518369     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00628-4     Document Type: Article

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