Charge equilibration process for channeled He ions along the Si〈1 0 0 〉 direction

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 148, Issue 1-4, 1999, Pages 168-171

  De Azevedo, G M ^a   Kaschny, J R A ^a   Dias, J F ^a   Grande, P L ^a   Behar, M ^a   Klatt, Ch ^b   Kalbitzer, S ^b  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b MAX PLANCK INSTITUT FÜR KERNPHYSIK   (Germany)

Author keywords

Channeling; Charge exchange; Energy loss

Indexed keywords

ELECTRIC CHARGE; HELIUM; SILICON WAFERS;

CHARGE EQUILIBRATION; CHARGE EXCHANGE;

ION BOMBARDMENT;

EID: 0033513905     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0168-583x(98)00801-5     Document Type: Article

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