Deposition and characterization of TiAlZrN films produced by a combined steered arc and unbalanced magnetron sputtering technique

Surface and Coatings Technology

Volumn 74-75, Issue PART 1, 1995, Pages 123-134

  Donohue, L A ^a   Cawley, J ^a   Brooks, J S ^a   Munz W D ^a  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

Arc Bond Sputter; PVD coatings; Steered arc; Superlattice; Unbalanced magnetron

Indexed keywords

ADHESION; CHARACTERIZATION; FILMS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; PHYSICAL PROPERTIES; SPUTTER DEPOSITION; STAINLESS STEEL; SUBSTRATES; SUPERLATTICES; TITANIUM COMPOUNDS; VAPOR DEPOSITION;

ARC-BOND SPUTTER; PHYSICAL VAPOR DEPOSITION; STEERED ARC; UNBALANCED MAGNETRON;

INORGANIC COATINGS;

EID: 0029378524     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)08298-0     Document Type: Article

References (10)

1. Titanium aluminum nitride films: A new alternative to TiN coatings
2. Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum
3. Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniques
4. Deposition and properties of polycrystalline TiN/NbN superlattice coatings