Remote microwave plasma enhanced chemical vapour deposition of alumina on metallic substrates

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 233-237

  Ntsama Etoundi, M C ^a   Desmaison, J ^b   Tristant, P ^b   Tixier, C ^b  

^a SNECMA   (France)

^b UNIVERSITY OF LIMOGES   (France)

Author keywords

Aluminum oxide; Insulating layers; Metallic substrates; Remote microwave plasma enhanced chemical vapour deposition (RMPECVD)

Indexed keywords

CHEMICAL; COATING; PLASMA TREATMENT; VAPOR DEPOSITION;

EID: 0033504660     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00495-8     Document Type: Conference Paper

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