Deposition of high quality silicon dioxide on Hg1-xCdxTe by low-temperature liquid phase deposition method

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 1, 1999, Pages 102-107

  Wang, N F ^a   Chang, W J ^a   Houng, M P ^a   Wang, Y H ^a   Huang, C J ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033484175     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581558     Document Type: Article

References (22)

1. M. B. Reine, A. K. Sood, and T. J. Tredwell, Semiconductors and Semimetals, edited by R. K. Willardson and A. C. Beer (Academic, New York, 1981), Vol. 18, Chap. 6, p. 203.
2. J. H. Jeong, H. C. Lee, and C. K. Kim, Jpn. J. Appl. Phys., Part 2 31, L1785 (1992).
3. Y. Nemirovsky, N. Amir, and L. Djaloshinski, J. Electron. Mater. 24, 647 (1995).
4. N. Kajihara, G. Sudo, Y. Miyamoto, and K. Tanikawa, J. Electrochem. Soc. 135, 1252 (1988).
5. B. K. Janousek, R. C. Carscallen, and P. A. Bertrand, J. Vac. Sci. Technol. A 1, 1723 (1983).
6. J. A. Wilson and V. A. Cotton, J. Appl. Phys. 57, 2030 (1985).
7. B. K. Lanousek and R. C. Carscallen, J. Vac. Sci. Technol. A 3, 195 (1985).
8. J. F. Wager and D. R. Rhiger, J. Vac. Sci. Technol. A 3, 212 (1985).
9. J. D. Lin, Y. K. Su, S. J. Chang, M. Yokoyama, and F. Y. Juang, J. Vac. Sci. Technol. A 12, 7 (1994).
10. Y. Nemirovsky and G. Bahir, J. Vac. Sci. Technol. A 7, 450 (1989).
11. H. Nagayama, H. Honda, and H. Kawahara, J. Electrochem. Soc. 135, 2013 (1988).
12. J. S. Chou and S. C. Lee, J. Electrochem. Soc. 141, 3214 (1994).
13. K. Shimanoe and M. Sakashita, Jpn. J. Appl. Phys., Part 1 30, 2723 (1991).
14. C. Wei, K. K. Mishra, and K. Rajeshwar, Chem. Mater. 4, 77 (1992).
15. G. H. Winton, K. Prasad, L. Faraone, and M. A. C. Hotchkiss, J. Electron. Mater. 22, 1 (1993).
16. M. Jain, B. D. Nener, N. Warrington, M. V. Baker, J. L. Robins, and L. Faraone, J. Electrochem. Soc. 142, 2480 (1995).
17. N. Mainzer, E. Weiss, D. Laser, and M. Shaanan, J. Vac. Sci. Technol. A 7, 460 (1989).
18. C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder, and G. E. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer, Eden Prairie, 1979).
19. T. Takahagi, A. Ishitani, H. Kuroda, and Y. Nagasawa, J. Appl. Phys. 69, 803 (1991).
20. W. A. Pliskin, J. Vac. Sci. Technol. 14, 1064 (1977).
21. D. H. Rhiger and R. E. Kvaas, J. Vac. Sci. Technol. 21, 168 (1982).
22. M. P. Houng, Y. H. Wang, N. F. Wang, C. J. Huang, and W. J. Chang, Jpn. J. Appl. Phys., Part 2 36, L696 (1997).