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Volumn 35, Issue SUPPL. 2, 1999, Pages

Hydrogenated amorphous carbon-nitride films deposited on Si(100) by direct-current saddle-field plasma-enhanced chemical-vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0033447228     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.