Silicon carbide thin films synthesized by using pulsed YAG laser deposition

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 2, 1999, Pages

  Suda, Y ^a   Kawasaki, H ^a   Terajima, R ^a   Emura, M ^a   Baba, K ^b   Abe, H ^c   Yoshida, H ^c   Ebihara, K ^d   Aoqui, S ^e  

^a SASEBO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b Technology Center of Nagasaki   (Japan)

^c Ceramic Research Center of Nagasaki   (Japan)

^d KUMAMOTO UNIVERSITY   (Japan)

^e SOJO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033433874     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (21)

1. L. S. Liao. X. M. Bao, Z. F Yang and N. B. Min, Appl. Phys. Lett. 66, 2382 (1995).
2. E. G. Wang, Physica B185, 85 (1993).
3. H. Matsunami, S. Nishino and H. Ono, IEEE Trans. Electron Devices ED-28, 1235 (1981).
4. S. Nishino, J. A. Powell and H. A. Will, Appl. Phys. Lett. 42, 460 (1983).
5. P. Liaw and R. P. Davis, J. Electrochem. Soc. 132, 642 (1985).
6. S. Nishino, H. Suhara, H. Ono and H. Matsunami, J. Appl. Phys. 61, 4889 (1987).
7. J. A. Powell, L. G. Matus and M. A. Kuczmarski, J. Electrochem. Soc. 134, 1558 (1987).
8. A. J. Steckl and J. P. Li, IEEE Trans. Electron Devices ED-39, 64 (1992).
9. I. Golecki, F. Reidinger and J. Marti, Appl. Phys. Lett. 60, 1703 (1992).
10. A. J. Steckl, C. Yuan. J. P. Li and M. J. Loboda, Appl. Phys. Lett. 63, 3347 (1993).
11. Q. Wahab, L. Hultman, I. P. Ivanov, M. Willander and J-E. Sundgren, J. Mater. Res. 10, 1349 (1995).
12. L. Rimai, R. Ager, W. H. Weber, J. Hangas, A. Samman and W. Zhu, J. Appl. Phys. 77, 6601 (1995).
13. E. Danna, C. Leggieri, A. Luches, V. Nassisi, A. Perrone, G. Majni and P. Mengucci, Appl. Surf. Sci. 36, 500 (1989).
14. T. Yoshinobu, H. Mitsui, Y. Tarui and H. Matsunami, J. Appl. Phys. 72, 2006 (1992).
15. G. L. Zhou, Z. Ma, M. E. Lin, T. C. Shen, L. H. Allen and H. Morkoc, J. Cryst. Growth 134, 167 (1993).
16. L. S. Liao, X. M. Bao, Z. F. Yang and N. B. Min, Appl. Phys. Lett. 66, 2382 (1995).
17. K. J. Reason, J. Stocmenos and P. L. F. Hemment, Thin Solid Films 191, 147 (1990).
18. D. B. Chrisey and C. K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994).
19. Y. Suda, T. Nakazono, K. Ebihara and K. Baba, Thin Solid Films 281, 324 (1996).
20. Y. Suda, T. Nakazono, K. Ebihara and K. Baba, Nucl. Instr. and Meth. in Phys. Res. B121, 396 (1997).
21. Y. Suda, T. Nakazono, K. Ebihara, K. Baba and S. Aoqui, Carbon 36, 771 (1998).