Fine control of deposition film compositions using radio-frequency reactive sputtering with periodic gas additions

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3312-3316

  Kimura, Shoji ^a   Honda, Takuya ^a   Fukushi, Daigo ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033432505     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582058     Document Type: Article

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