Application of the dielectric barrier discharge jet in surface treatment and film deposition

Annals of the New York Academy of Sciences

Volumn 891, Issue , 1999, Pages 216-222

  Nutsch, G ^a   Nolin, S ^b   Heider, Th ^a   Rother, W ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE;

CONFERENCE PAPER; DIELECTRIC CONSTANT; FILM; GAS FLOW; SURFACE PROPERTY; VELOCITY;

EID: 0033427670     PISSN: 00778923     EISSN: None     Source Type: Book Series    
DOI: 10.1111/j.1749-6632.1999.tb08768.x     Document Type: Conference Paper

References (4)

1. 1. B. Eliasson and U. Kogelschatz, Modeling and application of silent discharge plasmas IEEE - PS 19 (1991), pp 309-323
2. 2. J. Salge, Plasma-assisted deposition at atmospheric pressure, Surface and Coatings Techn. 80 (1996), pp 1-7
3. 3. R. Thyen, Plasma-assisted deposition of thin films at atmospheric pressure (in German), Zeitschrift JOT 1998, Heft 5, XII-XV,
4. 4. W. Rother, S. Nolin, Th. Heider, G. Nutsch, Study of the remote plasma of the dielectric barrier discharge (in German) Proc. Workshop Plasmatechnology, 1998, FG Plasma-und Oberflächentechnik, TU Ilmenau, pp. 98-104