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Volumn 17, Issue 6, 1999, Pages 3368-3378

Reaction layer dynamics in ion-assisted Si/XeF2 etching: Ion flux dependence

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0033419510     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582068     Document Type: Article
Times cited : (4)

References (23)
  • 20
    • 85034556363 scopus 로고    scopus 로고
    • note
    • 0 with respect to Refs. 2 and 18 in order to make them independent of the surface roughness.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.