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Volumn 17, Issue 6, 1999, Pages 3368-3378
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Reaction layer dynamics in ion-assisted Si/XeF2 etching: Ion flux dependence
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0033419510
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.582068 Document Type: Article |
Times cited : (4)
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References (23)
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