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Volumn 28, Issue 4, 1999, Pages 292-296
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Synchrotron Radiation-excited Glancing Incidence XRF for Depth Profile and Thin-Film Analysis of Light Elements
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM;
FLUORESCENCE;
GERMANIUM COMPOUNDS;
SILICON WAFERS;
SYNCHROTRONS;
THIN FILMS;
X RAY DETECTORS;
X RAY SPECTROMETERS;
X RAY SPECTROSCOPY;
ANALYSIS OF LIGHT ELEMENTS;
BEAM-LINES;
CONVENTIONAL INSTRUMENTS;
DEPTH-PROFILE;
ELEMENT CARBONS;
GLANCING INCIDENCE;
LOW Z-ELEMENTS;
SPECIAL ENERGY;
THIN FILM ANALYSIS;
X RAY FLUORESCENCE ANALYSIS;
SYNCHROTRON RADIATION;
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EID: 0033414687
PISSN: 00498246
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1097-4539(199907/08)28:4<292::AID-XRS354>3.0.CO;2-A Document Type: Article |
Times cited : (13)
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References (9)
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