Enhancement of the etch rate of LiNbO3 by prior bombardment with MeV O2+ ions

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3358-3361

  Leech, Patrick W ^a   Ridgway, Mark C ^b,c  

^a CSIRO   (Australia)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^c CENTRE DE CALCUL DE L INSTITUT NATIONAL DE PHYSIQUE NUCLEAIRE ET DE PHYSIQUE DES PARTICULES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033413518     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582066     Document Type: Article

References (14)

1. B. Zhang, S. Forouhar, S. Y. Huang, and W. S. C. Chang, J. Lightwave Technol. LT-2, 256 (1984).
2. C. I. H. Ashby and P. J. Brannon, Appl. Phys. Lett. 49, 475 (1986).
3. G. Gotz and H. Karge, Nucl. Instrum. Methods, 209/210, 1079 (1983).
4. M. Kawabe, M. Kubota, K. Masuda, and S. Namba, J. Vac. Sci. Technol. 15, 1096 (1978).
5. C. I. H. Ashby, G. W. Arnold, and P. J. Brannon, J. Appl. Phys. 65, 93 (1989).
6. R. E. Chapman, Vacuum 34, 417 (1984).
7. D. A. Darbyshire, A. P. Overbury, and C. W. Pitt, Vacuum 36, 55 (1986).
8. C. L. Lee and C. L. Lu, Appl. Phys. Lett. 35, 756 (1979).
9. P. W. Leech, J. Vac. Sci. Technol. A 16, 2037 (1998).
10. G. S. Oehrlein, Y. Zhang, D. Vender, and O. Joubert, J. Vac. Sci. Technol. A 12, 333 (1994).
11. C. Steinbruchel, Appl. Phys. Lett. 55, 1960 (1989).
12. C. Steinbruchel, J. Electrochem. Soc. 130, 648 (1983).
13. C. Steinbruchel, Mater. Res. Soc. Symp. Proc. 129, 477 (1989).
14. Handbook of Physics and Chemistry, 77th ed. (Chemical Rubber, New York, 1996), pp. 4-37.