Substrate-rotation systems and productivity of industrial PVD processes

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 694-698

  Rother, B ^a   Ebersbach, G ^b   Gabriel, H M ^c  

^a MAT GmbH Dresden   (Germany)

^b Inst Phys Mechanische Technologien   (Germany)

^c PVTGmbH   (Germany)

Author keywords

Industrial coating systems; Physical vapour deposition; Substrate rotation systems

Indexed keywords

INTERFACES (MATERIALS); SUBSTRATES;

INDUSTRIAL COATING SYSTEMS; PHYSICAL VAPOR DEPOSITION (PVD); SUBSTRATE-ROTATION SYSTEMS;

VAPOR DEPOSITION;

COATING; PRODUCTIVITY; TOOL; VAPOR DEPOSITION;

EID: 0033387792     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00120-6     Document Type: Conference Paper

References (4)

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2. Friedrich C., Berg G., Broszeit E., Berger C. Fundamental economical aspects of functional coatings for tribological applications. Surf. Coat. Technol. 98:1998;816-822.
3. Rother B. On the possibility of physical vapour deposition process design by coordinated substrate rotation modes. Surf. Coat. Technol. 64:1994;155-159.
4. Rother B., Gabriel H.M. Multilayer hard coatings by coordinated substrate rotation modes in industrial PVD deposition systems. Surf. Coat. Technol. 86/87:1996;207-211.