Structure and properties of diamond films deposited on porous silicon

Thin Solid Films

Volumn 355, Issue , 1999, Pages 233-238

  Baranauskas, Vitor ^a   Li, Bin Bin ^a   Peterlevitz, Alfredo C ^a   Tosin, Marcelo C ^a   Durrant, Steven F ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COALESCENCE; CRYSTALLINE MATERIALS; DEPOSITION; ETHANOL; FILM GROWTH; HYDROGEN; NUCLEATION; POROUS SILICON; SILICON WAFERS; THERMAL STRESS;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0033365070     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00488-5     Document Type: Article

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