X-ray photoelectron spectroscopy study of rhodium particle growth on different alumina surfaces

Surface Science

Volumn 433, Issue , 1999, Pages 612-616

  Zafeiratos, S ^a   Nehasil, V ^b   Ladas, S ^a,c  

^a UNIVERSITY OF PATRAS   (Greece)

^b CHARLES UNIVERSITY   (Czech Republic)

^c NONE   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ARGON; BINDING ENERGY; CHARGE TRANSFER; CRYSTAL GROWTH; ELECTRON BEAMS; EVAPORATION; SINGLE CRYSTALS; SUBSTRATES; SURFACE STRUCTURE; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

CLUSTERS; ELECTRON BEAM EVAPORATION; FULL WIDTH AT HALF MAXIMUM; MODIFIED AUGER PARAMETER; RHODIUM PARTICLE GROWTH;

RHODIUM;

EID: 0033357339     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00029-1     Document Type: Article

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