Growth and morphology of Rh deposits on an alumina film under UHV conditions and under the influence of CO

Surface Science

Volumn 391, Issue 1-3, 1997, Pages 204-215

  Baumer M ^a   Frank, M ^a   Libuda, J ^a   Stempel, S ^a   Freund, H J ^a  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

Author keywords

Aluminum oxide; Carbon monoxide; Chemisorption; Clusters; Growth; Low energy electron diffraction (LEED); Rhodium; Scanning tunneling microscopy

Indexed keywords

ALUMINA; CARBON MONOXIDE; CHEMISORPTION; DECOMPOSITION; GAS ADSORPTION; GROWTH (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; SURFACE STRUCTURE; TEMPERATURE PROGRAMMED DESORPTION; VACUUM APPLICATIONS; VAPOR DEPOSITION;

SPOT PROFILE ANALYSIS; THERMAL DESORPTION SPECTROSCOPY;

RHODIUM;

EID: 0031270207     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00484-6     Document Type: Article

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