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Volumn 572, Issue , 1999, Pages 463-468

Comparative study of GaN growth process by MOVPE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; COMPUTATIONAL FLUID DYNAMICS; FLOW OF FLUIDS; HIGH TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTIMIZATION; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033356083     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-572-463     Document Type: Conference Paper
Times cited : (2)

References (8)
  • 4
    • 33751143077 scopus 로고
    • United States Patent, No. 5334227
    • S. Nakamura, United States Patent, No. 5334227, (1994).
    • (1994)
    • Nakamura, S.1
  • 6
    • 33751144711 scopus 로고    scopus 로고
    • CFDRC incorporation, Version 5
    • CFDACE theory manual, CFDRC incorporation, Version 5 (1998).
    • (1998) CFDACE Theory Manual


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.