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Volumn 572, Issue , 1999, Pages 463-468
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Comparative study of GaN growth process by MOVPE
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL REACTORS;
COMPUTATIONAL FLUID DYNAMICS;
FLOW OF FLUIDS;
HIGH TEMPERATURE EFFECTS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OPTIMIZATION;
SEMICONDUCTOR DEVICE MANUFACTURE;
GALLIUM NITRIDE;
HIGH TEMPERATURE GAS FLOW ZONE;
PREDEPOSITION REACTIONS;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0033356083
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-572-463 Document Type: Conference Paper |
Times cited : (2)
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References (8)
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