A statistical analysis of single and multiple response surface modeling

IEEE Transactions on Semiconductor Manufacturing

Volumn 12, Issue 4, 1999, Pages 419-430

  Smith, Taber H ^b   Goodlin, Brian E ^b   Boning, Duane S ^a,b   Sawin, Herb H ^b  

^a IEEE

^b Massachusetts Institute of Technology   (United States)

Author keywords

Nonuniformity; Process control; Process modeling; Response surface modeling

Indexed keywords

CHEMICAL POLISHING; PROCESS CONTROL; SEMICONDUCTOR DEVICE MODELS; STATISTICAL METHODS;

CHEMICAL MECHANICAL POLISHING (CMP); MULTIPLE RESPONSE SURFACE (MRS) TECHNIQUES; SINGLE RESPONSE SURFACE (SRS) TECHNIQUES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033355124     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.806119     Document Type: Article

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