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Volumn 2912, Issue , 1997, Pages 146-158

A flexible, distributed architecture for semiconductor process control and experimentation

Author keywords

Distributed architecture; Distributed interface; In situ data acquisition; Semiconductor process control

Indexed keywords

ARCHITECTURE; CHARGE COUPLED DEVICES; COMPUTER ARCHITECTURE; CONTROL SYSTEMS; CONTROL THEORY; DIGITAL CAMERAS; ELECTRIC CONDUCTIVITY; ETCHING; FABRICATION; FEEDBACK; FEEDBACK CONTROL; IMAGE ENHANCEMENT; INFORMATION RETRIEVAL SYSTEMS; MERGERS AND ACQUISITIONS; OPEN SYSTEMS; PLASMA ETCHING; PLASMAS; QUALITY CONTROL; ROBUST CONTROL; SECURITY OF DATA; SEMICONDUCTING INDIUM; SEMICONDUCTOR MATERIALS; SENSORS;

EID: 58049158298     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.263364     Document Type: Conference Paper
Times cited : (2)

References (13)
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    • K. Wong and D. Boning, On In-situ Etch Rate Extraction from Interferometric Signals, Process Control, Diagnostics & Modeling in Semiconductor Manufacturing, M. Meyyappan, D Economou, and S. Butler, Proceedings 95-2, pp. 360-371, The Electrochemical Society, Pennington, NJ, 1995.
    • K. Wong and D. Boning, "On In-situ Etch Rate Extraction from Interferometric Signals," Process Control, Diagnostics & Modeling in Semiconductor Manufacturing, M. Meyyappan, D Economou, and S. Butler, Proceedings Volume 95-2, pp. 360-371, The Electrochemical Society, Pennington, NJ, 1995.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.