Contact hole etch scaling toward 0.1 μm

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 B, 1999, Pages 7119-7121

  Aoi, Nobuo ^a   Hayashi, Shigenori ^a   Yamanaka, Michinari ^a   Kubota, Masafumi ^a   Ogura, Mototsugu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Aspect ratio; Contact diameter; Contact hole etching; RIE lag

Indexed keywords

ASPECT RATIO; REACTIVE ION ETCHING;

CONTACT HOLE ETCHING;

PHOTORESISTS;

EID: 0033354648     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.7119     Document Type: Article

References (3)

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3. N. Aoi, M. Kubota and T. Komeda: Micro Process Conf., Tokyo (1988) p. 138.