Electron confinement in multi-anode saw tooth silicon drift detectors with an anode pitch of 250 μm

IEEE Transactions on Nuclear Science

Volumn 46, Issue 3 PART 1, 1999, Pages 271-274

  Sonsky J ^b   Valk, H ^b   Huizenga, J ^b   Hollander, R W ^a,b   Van Eijk, C W E ^a,b   Sarro, P M ^b  

^a IEEE

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CATHODES; COMPUTER SIMULATION; ELECTRONS; SEMICONDUCTING SILICON;

CHARGE CAPACITY; ELECTRON CONFINEMENT; MULTI ANODE SAW TOOTH SILICON DRIFT DETECTORS; SAW TOOTH DETECTOR;

PARTICLE DETECTORS;

EID: 0033353276     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.775526     Document Type: Article

References (5)

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2. E.A. Hijzen, E.M. Schooneveld, C.W.E. van Eijk, and R.W. Hollander, "New silicon drift detector design for diminishing lateral diffusion," Nucl. Instrum. Methods, vol. A335, 1993 pp. 271-275.
3. A. Castoldi, P. Rehak, and L. Strüder, " Electron confinement in Drift Detectors by Means of 'Channel-Stop' Implants: Characterization at High Signal Charges," IEEE Trans. Nucl. Sci., vol. 43, 1996 pp. 3201-3206.
4. + Strips," accepted for publication in IEEE Trans. Nucl. Sci.
5. A. Castoldi, S. Chinnici, E. Gatti, A. Longoni, M. Sampietro, A. Vacchi, and P. Rehak, "A method for doping fluctuations measurement in high resistivity silicon" J. Appl. Phys, vol. 71(7), 1992 pp. 3593-3599.