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Volumn 12, Issue 4, 1999, Pages 516-522

Use of voltage stressing at wafer probe for reliability predictions

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; RELIABILITY; STRESSES;

EID: 0033350554     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.806129     Document Type: Article
Times cited : (6)

References (9)
  • 1
    • 0026138177 scopus 로고
    • Development of a burn-in time reduction algorithm using the principles of acceleration factors
    • A. Suyko and S. Sy, "Development of a burn-in time reduction algorithm using the principles of acceleration factors," in IEEE IRPS Proc., 1991, pp. 264-270.
    • (1991) IEEE IRPS Proc. , pp. 264-270
    • Suyko, A.1    Sy, S.2
  • 2
    • 0025464151 scopus 로고
    • Projecting gate oxide reliability and optimizing reliability screens
    • July
    • R. Moazzami and C. Hu, "Projecting gate oxide reliability and optimizing reliability screens," IEEE Trans. Electron Devices, vol. 37, pp. 1643-1650, July 1990.
    • (1990) IEEE Trans. Electron Devices , vol.37 , pp. 1643-1650
    • Moazzami, R.1    Hu, C.2
  • 3
    • 0026139718 scopus 로고
    • Burn-in effectiveness - Theory and measurement
    • H. H. Huston, M. H. Wood, and V. M. DePalma, "Burn-in effectiveness - Theory and measurement," in IEEE IRPS Proc., 1991, pp. 271-276.
    • (1991) IEEE IRPS Proc. , pp. 271-276
    • Huston, H.H.1    Wood, M.H.2    DePalma, V.M.3
  • 7
    • 0022223020 scopus 로고
    • Acceleration factors for thin gate oxide stressing
    • J. W. McPherson and D. A. Baglee, "Acceleration factors for thin gate oxide stressing," in IEEE IRPS Proc., 1985, pp. 1-5.
    • (1985) IEEE IRPS Proc. , pp. 1-5
    • McPherson, J.W.1    Baglee, D.A.2
  • 9
    • 0030388671 scopus 로고    scopus 로고
    • Characterization of intrinsic thin silicon dioxide breakdown under static and dynamic stress
    • P. Chaparala and J. S. Suehle, "Characterization of intrinsic thin silicon dioxide breakdown under static and dynamic stress," in SPIE Microelectronic Manufacturing Conf. Proc., 1996, pp. 114-124.
    • (1996) SPIE Microelectronic Manufacturing Conf. Proc. , pp. 114-124
    • Chaparala, P.1    Suehle, J.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.