Modification of MoO3 surfaces by vapour-deposited cobalt atoms

Surface Science

Volumn 433, Issue , 1999, Pages 723-727

  Kleyna, R ^a   Mex, H ^a   Voss M ^a   Borgmann, D ^a   Viscido, L ^b   Heras, J M ^b  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b INSTITUTO DE INVESTIGACIONES FISICOQUÍMICAS TEÓRICAS Y APLICADAS INIFTA   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMS; ELECTRON ENERGY LEVELS; EVAPORATION; MOLYBDENUM COMPOUNDS; POLYCRYSTALLINE MATERIALS; SURFACES; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

COBALT LAYER THICKNESS; MOLYBDENUM OXIDES; NON STOICHIOMETRIC COBALT MOLYBDATE;

COBALT;

EID: 0033350035     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00158-2     Document Type: Article

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