Thermal waves of a nonaxisymmetric flow in a Czochralski-type silicon melt

Journal of Crystal Growth

Volumn 207, Issue 1, 1999, Pages 55-61

  Nakamura, Shin ^a   Eguchi, Miroru ^a   Azami, Takeshi ^a   Hibiya, Taketoshi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON; TEMPERATURE MEASUREMENT;

ROSSBY NUMBER; THERMAL WAVE NUMBER;

CRYSTAL GROWTH FROM MELT;

EID: 0033349899     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00357-7     Document Type: Article

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