In-plane orientation in poly(amic acid)s during thermal imidization

Polymer Journal

Volumn 31, Issue 9, 1999, Pages 707-710

  Morino, Shin'ya ^a   Horie, Kazuyuki ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; CURING; EVAPORATION; MOLECULAR ORIENTATION; PHASE INTERFACES; PLASTIC FILMS; REFRACTIVE INDEX; SOLVENTS; SYNTHESIS (CHEMICAL); THIN FILMS;

POLYAMIC ACID; THERMAL IMIDIZATION;

AROMATIC POLYMERS;

EID: 0033349245     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.31.707     Document Type: Article

References (15)

1. T. P. Russel, H. Gugger, and J. D. Swalen, J. Polym. Sci., Polym. Phys. Ed., 21, 1745 (1983).
2. S. Ando, T. Sawada, and Y. Inoue, in "Polymeric materials for Microelectronic Applications," H. Ito, S. Tagawa, and K. Horie, Ed., ACS Symposium Series 579, American Chemical Society, Washington, D.C., 1994, p 283.
3. F. Li, F. W. Harris, and S. Z. D. Cheng, Polymer, 37, 5321 (1996).
4. R. M. Ikeda, J. Polym. Sci., Polym. Lett. Ed., 4, 353 (1996).
5. M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura, J. Photopolym. Sci. Technol., 7, 275 (1994).
6. M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura, Macromolecules, 29, 7987 (1996).
7. S. Ermer, in "Photosensitive Polyimides," K. Horie, and T. Yamashita, Ed., Technomic Publ. Co., Lancaster, 1995, Chapter 10.
8. L. Lin and S. A. Bidstrup, J. Appl. Polym. Sci., 54, 553 (1994).
9. M. Ree, Y.-H. Park, K. Kim, C. K. Cho, and C. E. Park, Polymer, 38, 6333 (1997).
10. D. Boese, H. Lee, D. Y. Yoon, J. D. Swalen, and L. F. Tabolt, J. Polym. Sci., Phys. Ed., 30, 1321 (1992).
11. M. Ree, C. Chu, and M. J. Goldberg, J. Appl. Phys., 75, 1410 (1994).
12. F. Li, K. Kim, E. P. Savitski, J. Chen, F. W. Harris, and S. X. D. Cheng, Polymer, 38, 3223 (1997).
13. P. K. Tien, Appl. Opt., 10, 2395 (1971).
14. W. M. Prest and D. J. Luca, J. Appl. Phys., 50, 6067 (1979).
15. W. M. Prest and D. J. Luca, J. Appl. Phys., 51, 5170 (1980).