Dependence of electrically detected magnetic resonance signal shape from iron-contaminated silicon wafers on the thermal treatment of the samples

Physica B: Condensed Matter

Volumn 273-274, Issue , 1999, Pages 404-407

  Mchedlidze, T ^a   Matsumoto, K ^a   Lin, T C ^a   Suezawa, M ^b  

^a Komatsu Electronic Metals Co Ltd   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; CRYSTAL GROWTH FROM MELT; HEAT TREATMENT;

ELECTRICALLY DETECTED MAGNETIC RESONANCE (EDMR) SIGNAL;

SILICON WAFERS;

EID: 0033348768     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(99)00491-3     Document Type: Article

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