Plasma nitriding of thin molybdenum layers at low temperature

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 222-228

  Jauberteau, I ^a   Jauberteau, J L ^a   Semeria M N ^b   Larre A ^c   Piaguet, J ^b   Aubreton, J ^a  

^a UNIVERSITY OF LIMOGES   (France)

^b CEA LETI   (France)

^c Parc Industriel Pompignane   (France)

Author keywords

Ar and H2 effect; Expanding plasma; Mo film; Nitriding process

Indexed keywords

ARGON; AUGER ELECTRON SPECTROSCOPY; HYDROGEN; MOLYBDENUM; NITRIDING; PLASMA APPLICATIONS; THIN FILMS;

PLASMA NITRIDING;

METALLIC FILMS;

EID: 0033344427     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00117-6     Document Type: Article

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