Complete analytical solutions of film planarization during spin coating

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3819-3826

  Wu, Pei Ying ^a   Chou, Fu Chu ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; SEMICONDUCTOR DEVICE MODELS; SURFACE TENSION; THIN FILMS;

DEGREE OF PLANARIZATION (DOP); SPIN COATING;

SEMICONDUCTING FILMS;

EID: 0033343704     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392558     Document Type: Article

References (19)

1. P.C. Sukanek, J. Electivclxm. Soc, 136,3019 (1989).
2. F.C. Chou, P, Y. Wu, and S. C. Gong, Jpn. J. Appl. Phys.. 37,4321 (1998).
3. P.Y.Wu, F. C. Chou, and S. C. Gong,/ ApplPhys., 86, In press.
4. L.E. Stillwagon and R. G. Urson, Phys. Fluids, A2,1937 (1990).
5. L.M. Peurning and D. B. Graves, / Elecirochem. Soc., 138, 2115 (1991).
6. D.E. Bomside. / Elecirochem. Soc., 137,2589 (1990).
7. L.M. Peurrung and D. B. Graves, IEEE Trans. Semicond. Mamifact., SM-6, 72 (1993).
8. J. Gu, M. D. Bullwinkel, and G. A. Campbell, J. Eleclrochem. Soc., 142, 907 (1995).
9. L.K. White, J. Electrvchem. Soc., 130, 1543 (1983).
10. L.K. White, J. Etectrvchem. Soc.. 132, 168 (1985).
11. L.K. White, J. Vac. Sei. Technol. B, 3, 862 (1985).
12. L.K. White, in Advances in Resist Technology and Processing II, SPIE, Proc. Vol. 539,29 (1985); SPIE-Int. Soc. Opt. Instrumentation Eng.
13. R.H. Wilson and P. A. Piacente, / Eleclrocliem. Soc., 133,981 (1986).
14. R.H. Wilson and P. A. Piacente, Semicond. Int.. 9,116 (April 1986).
15. T.H. Daubenspeck, J. K. DeBrosse, C. W. Koburger, M. Armacost, and J. R. Abernathey,}. Electrochem. Soc., 138,506 (1991).
16. A. Schlitz, ]pn. J. Appl. Phys.. 34,4185 (1995).
17. L.E. Stillwagon and R. G. Larson, J. Appl. Phys.. 63,5251 (1988).
18. F. Ma and J. H. Hwang, J. Appl. Phys.. 66,5026 (1989).
19. J.H. Hwang and F. Ma, J. Appl. Phys., 66,388 (1989).