메뉴 건너뛰기




Volumn 116-119, Issue , 1999, Pages 1145-1151

Characterisation of co-sputtered Nb:Cr coatings grown by the combined cathodic arc/unbalanced magnetron sputtering technique

Author keywords

Co sputtering; Cr; Magnetron sputtering; Nb; Thin films

Indexed keywords

CORROSION RESISTANCE; HARDNESS; METALLIC COATING; SPUTTERING;

EID: 0033340597     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00192-9     Document Type: Conference Paper
Times cited : (5)

References (24)
  • 14
    • 0001874777 scopus 로고
    • Glow discharge sputter deposition
    • J.L. Vossen, & W. Kern. Academic Press
    • Vossen J.L., Cuomo J.J. Glow discharge sputter deposition. Vossen J.L., Kern W. Thin Film Processes. 1978;12 Academic Press.
    • (1978) Thin Film Processes , pp. 12
    • Vossen, J.L.1    Cuomo, J.J.2
  • 15
    • 0009114885 scopus 로고    scopus 로고
    • Ji H. J. Appl. Phys. 81:(10):1997;6754.
    • (1997) J. Appl. Phys. , vol.81 , Issue.10 , pp. 6754
    • Ji, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.