Self-organized structuring of W/C multilayers on Si substrate

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 6, 1999, Pages 657-659

  Meyer, D C ^a   Klingner, A ^a   Holz, Th ^b   Paufler, P ^a  

^a IFW DRESDEN   (Germany)

^b FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; MULTILAYERS; OPTICAL MICROSCOPY; PULSED LASER APPLICATIONS; SILICON WAFERS; STRESS RELAXATION; TUNGSTEN CARBIDE; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION (PLD);

CERAMIC COATINGS;

EID: 0033339044     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051049     Document Type: Article

References (4)

1. R. Dietsch, T. Holz, H. Mai, C.-F. Meyer, R. Scholz, B. Wehner: Appl. Surf. Sci. 127-129, 451 (1998)
2. N. Matuda, S. Baba, A. Kinbara: Thin Solid Fims 81, 301-305 (1981)
3. G. Gille: "Strength of Thin Films and Coatings", In: Mechanical Properties of Brittle Materials. Modern Theories and Experimental Evidence. Wiss. Berichte des ZFW der AdW (DDR) 32, 267-323 (1986)
4. Metals Handbook, 9th edn., Vol. 2, Properties and Selection: Nonferrous Alloys and Pure Metals (American Society for Metals, Metals Park, Ohio 1979)